Integrated 1200°C multi-zone quartz tube furnace system designed for laboratory Chemical Vapor Deposition (CVD) applications, including graphene preparation.
Complete Chemical Vapor Deposition (CVD) system featuring a 1200°C tube furnace.
Equipped with three independently controlled heating zones (200mm each) for thermal gradient processing.
Includes a high-purity quartz process tube (50mm OD standard) suitable for CVD reactions.
Integrated multi-channel mass flow controlled gas mixing and delivery system.
Features a comprehensive vacuum system with pump and precision gauge for atmosphere control.
Specifically designed for laboratory-scale thin film deposition and material synthesis like graphene.
Safety system incorporates combustible gas detection linked to an automatic solenoid shut-off valve.
Maximum Design Temperature: 1200°C
Recommended Operating Temperature: ≤ 1100°C
Heating Zones: 3 (200mm length each)
Process Tube: High Purity Quartz (50mm OD x 1000mm L)
Gas Control System: 3-Channel Mass Flow Controlled
Vacuum Capability: Approx. 4.4 x 10E-3 Pa (Ultimate, system dependent)
We're here to help you with your needs. Let's talk about how we can help you.
